Hydrogen Peroxide siêu tinh khiết7722-84-1
7722-84-1
Tên hóa học: Hydrogen Peroxide siêu tinh khiết
Công thức phân tử: H₂O₂
Trọng lượng phân tử: 34,01 g / mol
Số CAS: 7722-84-1
| THÔNG SỐ | U.M. | Tối thiểu | Tối đa | |
| Xét nghiệm (H2O2) | % | 30.0 | 32.0 | |
| Màu | APHA | 5 | ||
| Nitrat (NO3) | PPB | 50 | ||
| Tổng cacbon hữu cơ (TOC) | Ppm | 20 | ||
| Clorua (Cl) | PPB | 30 | ||
| Sulfat (SO4) | PPB | 50 | ||
| Phốt phát (PO4) | PPB | 20 | ||
| TỐI ĐA TẠP CHẤT | U.M. | Tối thiểu | Tối đa | |
| Nhôm (Al) | PPB | 0.05 | ||
| Antimon (Sb) | PPB | 0.05 | ||
| Asen (As) | PPB | 0.05 | ||
| Bari (Ba) | PPB | 0.05 | ||
| Berili (Be) | PPB | 0.05 | ||
| Bismuth (Bi) | PPB | 0.05 | ||
| Boron (B) | PPB | 0.05 | ||
| Cadmium (Cd) | PPB | 0.05 | ||
| Canxi (Ca) | PPB | 0.05 | ||
| Crom (Cr) | PPB | 0.05 | ||
| Coban (Co) | PPB | 0.05 | ||
| Đồng (Cu) | PPB | 0.05 | ||
| Gali (Ga) | PPB | 0.05 | ||
| Germani (Ge) | PPB | 0.05 | ||
| Vàng (Au) | PPB | 0.05 | ||
| Sắt (Fe) | PPB | 0.05 | ||
| Chì (Pb) | PPB | 0.05 | ||
| Lithium (Li) | PPB | 0.05 | ||
| Magiê (Mg) | PPB | 0.05 | ||
| Mangan (Mn) | PPB | 0.05 | ||
| Molypden (Mo) | PPB | 0.05 | ||
| Niken (Ni) | PPB | 0.05 | ||
| Niobi (Nb) | PPB | 0.05 | ||
| Kali (K) | PPB | 0.05 | ||
| Bạc (Ag) | PPB | 0.05 | ||
| Sodium (Na) | ppb | 0.05 | ||
| Strontium (Sr) | ppb | 0.05 | ||
| Tantalum (Ta) | ppb | 0.05 | ||
| Thallium (Tl) | ppb | 0.05 | ||
| Tin (Sn) | ppb | 0.05 | ||
| Titanium (Ti) | ppb | 0.05 | ||
| Vanadium (V) | ppb | 0.05 | ||
| Zinc (Zn) | ppb | 0.05 | ||
| Zirconium (Zr) | ppb | 0.05 | ||
| PARTICULATE COUNT | U.M. | Minimum | Maximum | |
| ≧0.1 micron | pcs/ml | 300 | ||
| ≧0.2 micron | pcs/ml | 200 | ||
| ≧0.5 micron | pcs/ml | 100 | ||
| ≧1.0 micron | pcs/ml | 25 | ||
Physical and Chemical Properties
- Density: ~1.45 g/cm³ (at 20°C)
- Boiling Point: Decomposes before boiling (~150°C)
- Melting Point: -0.43°C
- pH: Slightly acidic (around pH 4.5 to 5.5 for diluted solutions)
- Solubility: Completely miscible with water
- Decomposition: Slowly decomposes into water (H₂O) and oxygen (O₂), accelerated by heat, light, and impurities
Key Applications
- Semiconductor Industry:
- Used for wafer cleaning, etching, and removing organic contaminants in microelectronics
- Essential for oxidation processes and cleaning prior to photolithography
- Electronics Manufacturing:
- High-purity etchant for circuit boards
- Used in chemical mechanical planarization (CMP) processes
- Chemical Synthesis:
- Oxidizing agent in high-purity chemical production
- Used for synthesizing fine chemicals and pharmaceuticals
- Environmental Applications:
- Wastewater treatment and air purification (advanced oxidation processes)
- Used in disinfecting and sterilization processes
- Pharmaceutical & Biotechnology:
- Used in sterilization, disinfection, and as a precursor in pharmaceutical synthesis
Safety and Handling
- Hazards: Strong oxidizer, can cause severe burns and eye damage. Reacts violently with organic material and reducing agents.
- Storage:
- Store in tightly sealed, compatible containers (e.g., HDPE, PFA)
- Keep in a cool, dry, and well-ventilated area away from sunlight and heat sources
- Protective Equipment: Wear chemical-resistant gloves, goggles, and lab coats. Use in a well-ventilated space or under a fume hood.
Market and Supply
- Major Producers: Evonik, Solvay, Arkema, Mitsubishi Gas Chemical, etc.
- Packaging: Supplied in high-purity containers, such as drums, IBC totes, or bulk delivery systems
- Regulations: Complies with industry standards for semiconductor-grade hydrogen peroxide and other high-tech applications
